Semiempirical profile simulation of aluminum etching in a...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2002 Vol. 20; Iss. 5

Semiempirical profile simulation of aluminum etching in a Cl[sub 2]/BCl[sub 3] plasma

Cooperberg, D. J., Vahedi, V., Gottscho, R. A.
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Volume:
20
Year:
2002
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1494818
File:
PDF, 1.51 MB
english, 2002
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