[IEEE 2006 International SiGe Technology and Device Meeting - Princeton, NJ, USA ()] 2006 International SiGe Technology and Device Meeting - Effective Surface Treatments for Selective Epitaxial SiGe Growth in Locally Strained pMOSFETs
Chin-I Liao,, Yi-Cheng Chen,, Po-Lun Cheng,, Hsiang-Ying Wang,, Chin-Cheng Chien,, Chan-Lon Yang,, Huang, K.T., Tzou, S.F., Jinsong Tang,, Kodali, R., Washington, L., Chang, V.C., Fu, T., YonahYear:
2006
Language:
english
DOI:
10.1109/istdm.2006.246517
File:
PDF, 1.80 MB
english, 2006