Novel α-amine-functionalized silica-based dispersions for selectively polishing polysilicon and Si(1 0 0) over silicon dioxide, silicon nitride or copper during chemical mechanical polishing
P.R. Veera Dandu, Naresh K. Penta, S.V. BabuVolume:
371
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.colsurfa.2010.09.019
File:
PDF, 439 KB
english, 2010