Morphology and oxidation kinetics of SiO 2 layers on silicon
Athanassouli, A, Ganetsos, Th, Klose, F, Messoloras, SVolume:
17
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/17/1/311
Date:
January, 2002
File:
PDF, 299 KB
english, 2002