[Japan Soc. of Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (29-31 Oct. 2003)] Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Cleaning of EUVL masks using 172-nm and 13.5-nm radiation
Hamamoto, K., Watanabe, T., Sakaya, N., Hosoya, M., Shoki, T., Hada, H., Hishinuma, N., Sugawara, H., Kinoshita, H.Year:
2003
Language:
english
DOI:
10.1109/imnc.2003.1268755
File:
PDF, 90 KB
english, 2003