Feasibility Study of Process Integration for High Aspect...

Materials and Manufacturing Processes 2011 / 09 Vol. 26; Iss. 9

Feasibility Study of Process Integration for High Aspect Ratio Hard-Mask Scheme Technologies of Low-k/Cu Interconnect Fabrication

Weng, Chun-Jen
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Volume:
26
Language:
english
Journal:
Materials and Manufacturing Processes
DOI:
10.1080/10426914.2010.529592
Date:
September, 2011
File:
PDF, 1.57 MB
english, 2011
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