![](/img/cover-not-exists.png)
[IEEE 2008 9th International Conference on Solid-State and Integrated-Circuit Technology (ICSICT) - Beijing, China (2008.10.20-2008.10.23)] 2008 9th International Conference on Solid-State and Integrated-Circuit Technology - Low-k breakdown improvement in 65nm dual-damascene Cu process
Wang, Qi, Gan, Howard, Zhao, Linlin, Zheng, Kevin, Bei, Emily, Ning, JayYear:
2008
Language:
english
DOI:
10.1109/icsict.2008.4734786
File:
PDF, 1.96 MB
english, 2008