Contribution of Interface States and Oxide Traps to the...

IEEE Electron Device Letters 2009 / 03 Vol. 30; Iss. 3

Contribution of Interface States and Oxide Traps to the Negative Bias Temperature Instability of High-$k$ pMOSFETs

Minseok Jo,, Man Chang,, Seonghyun Kim,, Hyung-Suk Jung,, Rino Choi,, Hyunsang Hwang,
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Volume:
30
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2008.2011926
Date:
March, 2009
File:
PDF, 474 KB
english, 2009
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