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[IEEE 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. - San Jose, CA, USA (April 17-21, 2005)] 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. - Role of dielectric and barrier integrity in reliability of sub-100 nm copper low-k interconnects
Tokei, Zs., Van Aelst, J., Waldfried, C., Escorcia, O., Roussel, P., Richard, O., Travaly, Y., Beyer, G.P., Maex, K.Year:
2005
Language:
english
DOI:
10.1109/relphy.2005.1493135
File:
PDF, 960 KB
english, 2005