Surface chemistry and damage in the high density plasma...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 1998 / 5 Vol. 16; Iss. 3

Surface chemistry and damage in the high density plasma etching of gallium arsenide

Leonhardt, D.
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Volume:
16
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581185
Date:
May, 1998
File:
PDF, 380 KB
english, 1998
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