Plasma processing of the silicon surface: A novel method to reduce transient enhanced diffusion of boron
Mannino, Giovanni, Priolo, Francesco, Privitera, Vittorio, Raineri, Vito, Spinella, Corrado, Napolitani, Enrico, Carnera, Alberto, Arena, Giuseppe, Messina, Alberto, Rapisarda, CirinoVolume:
84
Year:
1998
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.369037
File:
PDF, 748 KB
english, 1998