The regrowth of amorphous layers created by high-dose...

Applied Physics Letters 1978 Vol. 32; Iss. 1

The regrowth of amorphous layers created by high-dose antimony implantation in 〈100〉 silicon

Tamminga, Y., Josquin, W. J. M. J.
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Volume:
32
Year:
1978
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.89828
File:
PDF, 480 KB
english, 1978
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