Effect of high pressure isostatic annealing on oxygen...

Journal of Applied Physics 2003 Vol. 94; Iss. 12

Effect of high pressure isostatic annealing on oxygen segregation in Czochralski silicon

Binetti, Simona, Le Donne, Alessia, Emtsev, Vadim V., Pizzini, Sergio
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Volume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1626801
File:
PDF, 454 KB
english, 2003
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