Anomalous diffusion of boron in silicon driven under the...

IEEE Electron Device Letters 2000 / 12 Vol. 21; Iss. 12

Anomalous diffusion of boron in silicon driven under the N/sub 2/O ambient

Don-Gey Liu,, Wen Luh Yang,, Jiang-Shihn Tsang,, Kuo Wei Chu,, Miin-Shyue Shiau,, Yu Ming Hung,
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Volume:
21
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/55.887469
Date:
December, 2000
File:
PDF, 41 KB
english, 2000
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