[IEEE 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - Honolulu, HI, USA (June 13-15, 2006)] 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - A Low Cost Drive Current Enhancement Technique Using Shallow Trench Isolation Induced Stress for 45-nm Node
Le Cam, C., Guyader, F., de Buttet, C., Guyader, P., Ribes, G., Sardo, M., Vanbergue, S., Buf, F., Arnaud, F., Josse, E., Haond, M.Year:
2006
Language:
english
DOI:
10.1109/vlsit.2006.1705227
File:
PDF, 456 KB
english, 2006