Fabrication of submicron deep ultraviolet masks by ion microprojection
Stangl, G., Rüdenauer, F. G., Stengl, G., Löschner, H., Maurer, W., Wolf, P.Volume:
47
Year:
1985
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.96280
File:
PDF, 481 KB
english, 1985