Correlation between volume fraction of clusters incorporated into a-Si:H films and hydrogen content associated with Si–H[sub 2] bonds in the films
Koga, Kazunori, Kaguchi, Naoto, Shiratani, Masaharu, Watanabe, YukioVolume:
22
Year:
2004
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1763905
File:
PDF, 554 KB
english, 2004