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A new instrument for thermal electron attachment at high temperature: NF[sub 3] and CH[sub 3]Cl attachment rate constants up to 1100 K
Miller, Thomas M., Friedman, Jeffrey F., Williamson, John S., Schaffer, Linda C., Viggiano, A. A.Volume:
80
Year:
2009
Language:
english
Journal:
Review of Scientific Instruments
DOI:
10.1063/1.3097185
File:
PDF, 655 KB
english, 2009