Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1991 / 11 Vol. 9; Iss. 6
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Azide–novolak resin negative photoresist for i-line phase-shifting lithography
Uchino, Shou-ichiVolume:
9
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.585309
Date:
November, 1991
File:
PDF, 608 KB
english, 1991