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[IEEE 2005 IEEE VLSI-TSA. International Symposium on VLSI Technology (VLSI-TSA-TECH) - Hsinchu, Taiwan (25-27 April 2005)] IEEE VLSI-TSA International Symposium on VLSI Technology, 2005. (VLSI-TSA-Tech). - Characteristics of high performance PFETs with embedded SiGe source/drain and >100< channels on 45° rotated wafers
Qiqing Ouyang,, Meikei leong,, Fischetti, M., Panda, S., Boyd, D., Rim, K., Ott, J.A.Year:
2005
Language:
english
DOI:
10.1109/vtsa.2005.1497068
File:
PDF, 385 KB
english, 2005