[IEEE 2010 International Conference on Simulation of...

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[IEEE 2010 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD 2010) - Bologna, Italy (2010.09.6-2010.09.8)] 2010 International Conference on Simulation of Semiconductor Processes and Devices - Statistical simulation of metal-gate work-function fluctuation in high-κ/metal-gate devices

Yu, Chia-Hui, Han, Ming-Hung, Cheng, Hui-Wen, Su, Zhong-Cheng, Li, Yiming, Watanabe, Hiroshi
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Year:
2010
Language:
english
DOI:
10.1109/sispad.2010.5604544
File:
PDF, 123 KB
english, 2010
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