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High rate deep Si etching for through-silicon via applications
Sakai, Itsuko, Sakurai, Noriko, Ohiwa, TokuhisaVolume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3543635
File:
PDF, 461 KB
english, 2011