[IEEE 2007 15th International Conference on Advanced Thermal Processing of Semiconductors - Cannizzaro, Catania, Italy (2007.10.2-2007.10.5)] 2007 15th International Conference on Advanced Thermal Processing of Semiconductors - Ultra-Shallow Dopant Diffusion from Pre-Deposited RPCVD Monolayers of Arsenic and Phosphorus
Popadic, Milos, Nanver, Lis K., Scholtes, T.L.M.Year:
2007
Language:
english
DOI:
10.1109/rtp.2007.4383825
File:
PDF, 2.24 MB
english, 2007