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[IEEE 2000 Symposium on VLSI Technology. Digest of Technical Papers - Honolulu, HI, USA (13-15 June 2000)] 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104) - NBTI enhancement by nitrogen incorporation into ultrathin gate oxide for 0.10-μm gate CMOS generation
Kimizuka, N., Yamaguchi, K., Imai, K., Iizuka, T., Liu, C.T., Keller, R.C., Horiuchi, T.Year:
2000
Language:
english
DOI:
10.1109/vlsit.2000.852782
File:
PDF, 232 KB
english, 2000