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[IEEE 2008 International Workshop on Junction Technology (IWJT) - Shanghai, China (2008.05.15-2008.05.16)] Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08) - Process models for advanced annealing schemes and their use in device simulation

Pichler, P., Martinez-Limia, A., Kampen, C., Burenkov, A., Schermer, J., Paul, S., Lerch, W., Gelpey, J., McCoy, S., Kheyrandish, H., Pakfar, A., Tavernier, C., Bolze, D.
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Year:
2008
Language:
english
DOI:
10.1109/iwjt.2008.4540031
File:
PDF, 950 KB
english, 2008
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