[IEEE 2011 11th International Workshop on Junction...

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[IEEE 2011 11th International Workshop on Junction Technology (IWJT) - Kyoto, Japan (2011.06.9-2011.06.10)] 11th International Workshop on Junction Technology (IWJT) - Feasibility study of plasma doping using B2H6 and PH3 for shallow junction

Fuse, Genshu, Tanaka, Masaru, Murooka, Hiroki, Kuriyama, Masashi, Sugitani, Michiro
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Year:
2011
Language:
english
DOI:
10.1109/iwjt.2011.5969993
File:
PDF, 1.06 MB
english, 2011
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