![](/img/cover-not-exists.png)
[IEEE 2011 11th International Workshop on Junction Technology (IWJT) - Kyoto, Japan (2011.06.9-2011.06.10)] 11th International Workshop on Junction Technology (IWJT) - Feasibility study of plasma doping using B2H6 and PH3 for shallow junction
Fuse, Genshu, Tanaka, Masaru, Murooka, Hiroki, Kuriyama, Masashi, Sugitani, MichiroYear:
2011
Language:
english
DOI:
10.1109/iwjt.2011.5969993
File:
PDF, 1.06 MB
english, 2011