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Influence of growth temperature on the structure and electrical properties of high-permittivity TiO 2 films in TiCl 4 -H 2 O and TiCl 4 -O 3 atomic-layer-deposition processes
Arroval, T., Aarik, L., Rammula, R., Mändar, H., Aarik, J., Hudec, B., Hušeková, K., Fröhlich, K.Volume:
211
Language:
english
Journal:
physica status solidi (a)
DOI:
10.1002/pssa.201330086
Date:
February, 2014
File:
PDF, 1.07 MB
english, 2014