Computer simulations of an oxygen inductively coupled...

Plasma Sources Science and Technology 2011 / 02 Vol. 20; Iss. 1

Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition

Tinck, S, Bogaerts, A
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Volume:
20
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/20/1/015008
Date:
February, 2011
File:
PDF, 1016 KB
english, 2011
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