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The location and effects of Si in (Ti1– x Si x )N y thin films
Flink, Axel, Beckers, Manfred, Sjölén, Jacob, Larsson, Tommy, Braun, Slawomir, Karlsson, Lennart, Hultman, LarsVolume:
24
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/jmr.2009.0299
Date:
August, 2009
File:
PDF, 2.06 MB
english, 2009