[IEEE 2005 IEEE VLSI-TSA. International Symposium on VLSI Technology (VLSI-TSA-TECH) - Hsinchu, Taiwan (25-27 April 2005)] IEEE VLSI-TSA International Symposium on VLSI Technology, 2005. (VLSI-TSA-Tech). - Integration of a poisoning-free dual damascene CDO film stack for 90 nm & beyond low-k BEOL
Wu Ping Liu,, Tan, J.B., Wei Lu,, Pal, S., Yong Kong Siew,, Hai Cong,, Bei Chao Zhang,, Xian Bin Wang,, Fan Zhang,, Liang Choo Hsia,Year:
2005
Language:
english
DOI:
10.1109/vtsa.2005.1497085
File:
PDF, 352 KB
english, 2005