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[IEEE 2005 13th International Conference on Advanced Thermal Processing of Semiconductors - Santa Barbara, CA, USA (04-07 Oct. 2005)] 2005 13th International Conference on Advanced Thermal Processing of Semiconductors - Importance of Heat-Up Ramp Rate for Palladium-Silicide Fully-Silicided-Gate Structure Formation
Sano, K., Hosoi, T., Shibahara, K.Year:
2005
Language:
english
DOI:
10.1109/rtp.2005.1613697
File:
PDF, 1.79 MB
english, 2005