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Theoretical analysis of the oxygen insertion process in the oxidation reactions of H2O + H/Si(1 0 0) and 2H + H2O/Si(1 0 0): a molecular orbital calculation and an analysis of tunneling reaction
Hidekazu Watanabe, Shinkoh Nanbu, Zhi-Hong Wang, Jun Maki, Tsuneo Urisu, Mutsumi Aoyagi, Kenta OoiVolume:
383
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.cplett.2003.11.052
File:
PDF, 248 KB
english, 2004