[IEEE 2013 IEEE International Interconnect Technology Conference - IITC - Kyoto, Japan (2013.06.13-2013.06.15)] 2013 IEEE International Interconnect Technology Conference - IITC - New fluorocarbon free chemistry proposed as solution to limit porous SiOCH film modification during etching
Posseme, N., Vallier, L., Kao, C-L., Licitra, C., Petit-Etienne, C., Mannequin, C., Gonon, P., Belostotskiy, Sergey, Pender, J., Banola, S., Joubert, O., Nemani, S.Year:
2013
Language:
english
DOI:
10.1109/iitc.2013.6615591
File:
PDF, 613 KB
english, 2013