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[IEEE 2008 International Interconnect Technology Conference - IITC - Burlingame, CA, USA (2008.06.1-2008.06.4)] 2008 International Interconnect Technology Conference - Structure-Designable Formation-Method of Super Low-k SiOC Film (k=2.2) by Neutral-Beam-Enhanced-CVD
Yasuhara, Shigeo, Chung, Juhyun, Tajima, Kunitoshi, Yano, Hisashi, Kadomura, Shingo, Yoshimaru, Masaki, Matsunaga, Noriaki, Kubota, Tomohiro, Ohtake, Hiroto, Samukawa, SeijiYear:
2008
Language:
english
DOI:
10.1109/iitc.2008.4546929
File:
PDF, 291 KB
english, 2008