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[Ultra Clean Soc ISSM2000. Ninth International Symposium on Semiconductor Manufacturing - Tokyo, Japan (26-28 Sept. 2000)] Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) - Sub 0.2 μm lithography on 300 mm wafer
Ganz, D., Charles, A., Hornig, S.R., Hraschan, G., Koestler, W., Maltabes, J., Schedel, T., Schmidt, S., Mautz, K., Schuster, R.Year:
2000
Language:
english
DOI:
10.1109/issm.2000.993616
File:
PDF, 561 KB
english, 2000