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H atom-induced oxidation reaction on water-terminated Si surface, 2H + H2O/Si(1 0 0)–(2 × 1): A theoretical study
Hidekazu Watanabe, Zhi-Hong Wang, Shinkoh Nanbu, Jun Maki, Tsuneo Urisu, Mutsumi Aoyagi, Kenta OoiVolume:
412
Year:
2005
Language:
english
Pages:
6
DOI:
10.1016/j.cplett.2005.07.023
File:
PDF, 404 KB
english, 2005