The initial mechanisms of Al2O3 atomic layer deposition on OH/Si(1 0 0)-2 × 1 surface by tri-methylaluminum and water
Manik Kumer Ghosh, Cheol Ho ChoiVolume:
426
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.cplett.2006.05.126
File:
PDF, 388 KB
english, 2006