by Lithography-Induced Strain Relaxation
Wenisch, J., Gould, C., Ebel, L., Storz, J., Pappert, K., Schmidt, M. J., Kumpf, C., Schmidt, G., Brunner, K., Molenkamp, L. W.Volume:
99
Language:
english
Journal:
Physical Review Letters
DOI:
10.1103/physrevlett.99.077201
Date:
August, 2007
File:
PDF, 1.27 MB
english, 2007