Prolonged and rapid thermal annealing of boron implanted...

Journal of Applied Physics 1988 Vol. 64; Iss. 5

Prolonged and rapid thermal annealing of boron implanted silicon

Peter, C. R., de Souza, J. P., Hasenack, C. M.
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Volume:
64
Year:
1988
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.341610
File:
PDF, 735 KB
english, 1988
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