[IEEE 2006 International Conference on Advanced Semiconductor Devices and Microsystems - Smolenice, Slovakia (2006.10.16-2006.10.18)] 2006 International Conference on Advanced Semiconductor Devices and Microsystems - Leakage current and Physical properties of Tantalum oxide thin films for Micro capacitor integration
Kim, Insung-, Jaesung-Song,, Bokki-Min,Year:
2006
Language:
english
DOI:
10.1109/asdam.2006.331191
File:
PDF, 3.64 MB
english, 2006