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Functional design of a pulsed two-frequency capacitively coupled plasma in CF[sub 4]/Ar for SiO[sub 2] etching
Maeshige, Kazunobu, Washio, Gentaro, Yagisawa, Takashi, Makabe, ToshiakiVolume:
91
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1478138
File:
PDF, 1.45 MB
english, 2002