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[IEEE Microsystems (ASDAM) - Smolenice, Slovakia (2010.10.25-2010.10.27)] The Eighth International Conference on Advanced Semiconductor Devices and Microsystems - Material optimization of the alignment marks for the EBDW lithography

Matay, L., Andok, R., Barak, V., Ritomsky, A., Konecnikova, A., Kostic, I., Partel, S., Hudek, P.
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Year:
2010
Language:
english
DOI:
10.1109/asdam.2010.5666341
File:
PDF, 407 KB
english, 2010
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