[IEEE IEEE Conference Record - Abstracts. 1996 IEEE...

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[IEEE IEEE Conference Record - Abstracts. 1996 IEEE International Conference on Plasma Science - Boston, MA, USA (3-5 June 1996)] IEEE Conference Record - Abstracts. 1996 IEEE International Conference on Plasma Science - Study of high efficient Plasma Immersion Ion Implantation hydrogenation for CMOS poly-Si TFTs using an ICP plasma source

Shu Qin,, Yuanzhong Zhou,, Chung Chan,
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Year:
1996
Language:
english
DOI:
10.1109/plasma.1996.550207
File:
PDF, 114 KB
english, 1996
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