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[IEEE 2010 21st Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - San Francisco, CA, USA (2010.07.11-2010.07.13)] 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Inline composition and thickness control of SiON, HfSiON gate films using VUV capable spectroscopic ellipsometer
Rangarajan, Srinivasan, Shepard, Joseph, Dai, Min, MacNish, Shawn, Zhao, Qiang, Barnum, JeffYear:
2010
Language:
english
DOI:
10.1109/asmc.2010.5551421
File:
PDF, 194 KB
english, 2010