Advanced metrology needs for nanoelectronics lithography

Comptes Rendus Physique 2006 Vol. 7; Iss. 8

Advanced metrology needs for nanoelectronics lithography

Stephen Knight, Ronald Dixson, Ronald L. Jones, Eric K. Lin, Ndubuisi G. Orji, R. Silver, John S. Villarrubia, András E. Vladár, Wen-li Wu
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Volume:
7
Year:
2006
Pages:
11
DOI:
10.1016/j.crhy.2006.10.004
File:
PDF, 987 KB
2006
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