Constant-Current Wafer-Level Electromigration Test:...

IEEE Transactions on Device and Materials Reliability 2007 / 06 Vol. 7; Iss. 2

Constant-Current Wafer-Level Electromigration Test: Normalization of Data for Production Monitoring

Aubel, Oliver, Sullivan, T. D., Massey, D., Lee, T. C., Merrill, T., Polchlopek, S., Strong, A.
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Volume:
7
Language:
english
Journal:
IEEE Transactions on Device and Materials Reliability
DOI:
10.1109/tdmr.2007.902427
Date:
June, 2007
File:
PDF, 830 KB
english, 2007
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