Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2011 Vol. 29; Iss. 4
On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists
Bruce, R. L., Weilnboeck, F., Lin, T., Phaneuf, R. J., Oehrlein, G. S., Long, B. K., Willson, C. G., Alizadeh, A.Volume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3607604
File:
PDF, 937 KB
english, 2011