Surface reaction of CF[sub 2] radicals for fluorocarbon...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 1998 / 1 Vol. 16; Iss. 1

Surface reaction of CF[sub 2] radicals for fluorocarbon film formation in SiO[sub 2]/Si selective etching process

Inayoshi, Muneto
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Volume:
16
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.580977
Date:
January, 1998
File:
PDF, 396 KB
english, 1998
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