Atom Lithography with a Holographic Light Mask

Physical Review Letters 2002 / 2 Vol. 88; Iss. 8

Atom Lithography with a Holographic Light Mask

Mützel, M., Tandler, S., Haubrich, D., Meschede, D., Peithmann, K., Flaspöhler, M., Buse, K.
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Volume:
88
Language:
english
Journal:
Physical Review Letters
DOI:
10.1103/physrevlett.88.083601
Date:
February, 2002
File:
PDF, 382 KB
english, 2002
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