[IEEE 2003 8th International Symposium on Plasma- and...

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[IEEE 2003 8th International Symposium on Plasma- and Process-Induced Damage - Corbeil-Essonnes, France (24-25 April 2003)] 2003 8th International Symposium Plasma- and Process-Induced Damage. - Charging damage during contact etch triggered by increased borderless nitride conductivity

Cacciaot, A., Scarpa, A., Evseev, S., Diekema, M.
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Year:
2003
Language:
english
DOI:
10.1109/ppid.2003.1199721
File:
PDF, 317 KB
english, 2003
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